Benzanthrone polymerization gate in photopolymerizable...

Details Benzanthrone polymerization gate in photopolymerizable... Benzanthrone polymerization gate in photopolymerizable...

G - Physics

03

F

G03F 7/028 (2006.01) G03F 7/016 (2006.01) G03F 7/09 (2006.01)

Patent

CA 2169898

A light sensitive composition which is capable of photopolymerization which includes a photopolymerizable compound a free radical generating component and a benzanthrone or substituted benzanthrone which substantially prevents photopolymerization when the light sensitive composition is exposed to actinic radiation below a threshold amount but permits photopolymerization when the light sensitive composition is exposed to actinic radiation above a threshold amount. This achieves a gate effect which eliminates or decreases unwanted partial exposure in the nonimage areas and hence improves reproduction quality.

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