Lattice layer compounds and halogenated polymer mass...

Details Lattice layer compounds and halogenated polymer mass... Lattice layer compounds and halogenated polymer mass...

C - Chemistry, Metallurgy

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C01G 49/00 (2006.01) C01B 13/36 (2006.01) C01F 7/00 (2006.01) C01G 9/00 (2006.01) C01G 19/00 (2006.01) C08K 3/00 (2006.01) C08K 7/00 (2006.01) C08L 27/06 (2006.01)

Patent

CA 2195245

Lattice layer compounds have the general formula (I) LiaMeIIb- 2aMeIII2+a(OH)4+2bAn-2/n*mH2O, in which MeII stands for Mg, Ca, Zn and/or Sn2+, MeIII stands for Al and/or Fe3+; An- stands for a selected anion of n valence or for a mixture of anions, and the indices lie in the following ranges: 0 < a < (b-2)/2, 1 < b < 6 and m = 0 to 5, provided that b-2a > 2. Also disclosed is a process for producing these lattice layer compounds and halogenated polymer mass stabilisers containing these lattice layer compounds.

Des composés stratifiés réticulaires répondent à la formule générale (I) Li¿a?Me?II¿¿b-2a?Me?III¿¿2+a?(OH)¿4+2b?A?n-¿¿2/n?*mH¿2?O, dans laquelle Me?II¿ désigne Mg, Ca, Zn et/ou Sn?2+¿; Me?III¿ désigne Al et/ou Fe?3+¿; A?n-¿ désigne un anion sélectionné de valence n ou un mélange d'anions; et les indices sont compris dans les plages suivantes: 0 < a < (b-2)/2, 1 < b < 6 et m = 0 à 5, à condition que b-2a > 2. L'invention concerne également un procédé de production de ces composés stratifiés réticulaires et des stabilisateurs contenant ces composés stratifiés réticulaires pour masses polymères halogénées.

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