Method for forming a continuous oxide superconductor layer...

H - Electricity – 01 – L

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356/112, 204/96.

H01L 21/465 (2006.01) H01L 39/24 (2006.01)

Patent

CA 2027067

A method for forming an oxide superconductor thin film having different thickness portions, in a process for manufacturing a superconductor device, includes the step of forming an oxide superconductor thin film having a uniform thickness on a substrates. A portion of the oxide superconductor thin film is etch-removed so that the oxide superconductor thin film has a thin thickness portion. Preferably, before the etching, the oxide superconductor thin film is coated with a metal layer, and the oxide superconductor thin film and the metal layer are etched together by means of a physical dry etching process.

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