Process for producing a high-resolution surface pattern

B - Operations – Transporting – 41 – M

Patent

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B41M 3/14 (2006.01) B41M 1/36 (2006.01) B42D 15/00 (2006.01)

Patent

CA 2531901

The invention concerns a process for producing a high-resolution surface pattern (10) on a substrate and a multi-layer body produced by means of that process and an apparatus for carrying out the process. A printing substance is applied in pattern form to the substrate by means of a printing process (17). For fine structuring of the surface pattern (10), prior to application of the printing substance, a microscopic surface structure (12) with a plurality of grooves is replicated into the surface of the substrate. The fine structuring of the surface pattern is determined by the respective locally applied application amount of printing substance (13) and the respective local relief parameters of the microscopic surface structure (12), in particular orientation direction and profile shape.

L'invention concerne un procédé pour produire un motif avec une haute résolution sur une surface d'un substrat, un corps multicouche (28) produit selon ce procédé et un dispositif pour la mise en oeuvre dudit procédé. Selon l'invention, une substance d'impression (26) est appliquée de façon à former un motif sur le substrat au moyen d'un procédé d'impression. Pour permettre une structuration fine du motif, une structure superficielle microscopique, présentant une pluralité de rainures, est reproduite dans la couche superficielle du substrat avant l'application de la substance d'impression (26). Cette structuration fine du motif est déterminée par la quantité de substance d'impression (26) appliquée localement et par les paramètres de relief localisés de la structure superficielle microscopique, notamment le sens d'orientation et la forme de profil de cette dernière.

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