C - Chemistry – Metallurgy – 08 – K
Patent
C - Chemistry, Metallurgy
08
K
C08K 5/16 (2006.01) C07C 255/41 (2006.01) C07C 317/18 (2006.01) C07C 317/46 (2006.01) C07C 323/12 (2006.01) C07C 323/65 (2006.01) C07D 207/404 (2006.01) C07D 209/18 (2006.01) C07D 209/48 (2006.01) C07D 215/14 (2006.01) C07D 233/32 (2006.01) C07D 235/16 (2006.01) C07D 239/74 (2006.01) C07D 251/34 (2006.01) C07D 261/20 (2006.01) C07D 263/56 (2006.01) C07D 275/04 (2006.01) C07D 277/20 (2006.01) C07D 277/64 (2006.01) C07D 285/12 (2006.01) C07D 295/185 (2006.01) C07D 307/16 (2006.01) C07D 307/54 (2006.01) C07D 3
Patent
CA 2053904
2053904 9013597 PCTABS00002 Disclosed are poly-methine compounds having formula (I), wherein R1 is an unsubstituted or substituted alkoxycarbonyl, cycloalkoxycarbonyl or aryloxycarbonyl radical; an unsubstituted or substituted carbamoyl radical; or an unsubstituted or substituted alkylsulfonyl, cycloalkyl-sulfonyl or arylsulfonyl radical, or an unsubstituted or substituted aryl radical; R2 is an unsubstituted or substituted alkyl, cycloalkyl or aryl radical; R3 is hydrogen, alkyl, -OR2 or halogen; and L is an organic linking group bonded by non-oxo carbon atoms to the oxygen atoms adjacent to L. Also disclosed are admixtures of 100 to 10,000 ppm of at least one of the poly-methine compounds and certain condensation polymers. The resulting polymer compositions are useful to protect substrates or materials susceptible to degradation by ultraviolet light.
Coates Clarence Alvin Jr.
Hilbert Samuel David
Pruett Wayne Payton
Weaver Max Allen
Eastman Chemical Company
Gowling Lafleur Henderson Llp
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