C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 239/28 (2006.01) A01N 43/54 (2006.01) A01N 43/72 (2006.01) A01N 43/90 (2006.01) C07D 239/48 (2006.01) C07D 401/12 (2006.01) C07D 405/12 (2006.01) C07D 409/12 (2006.01) C07D 413/12 (2006.01) C07D 417/12 (2006.01) C07D 471/04 (2006.01) C07D 473/00 (2006.01)
Patent
CA 2073883
O.Z. 0050/42552 ABSTRACT OF THE DISCLOSURE: Pyrimidine derivatives of the formula I Image I where the substituents have the following meanings: R1 is hydrogen or alkyl; A is a substituted or unsubstituted bi- or tricyclic carbo- or heterocyclic radical which may contain one or several double bonds; CR2R3R4, where R2 and R3 are hydrogen or substituted or unsubstituted alkyl and R4 is substituted or unsubstituted naphthyl with the exception of 1-naphthyl, substituted or unsubstituted cycloalkyl, R4 may also, if Y is NH2 and X is not trifluoromethyl, be cyclopropyl, R4 may also be substituted or unsubstituted bicycloalkyl or mono- or bicyclic heterocyclyl having 1 to 3 heteroatoms selected from the group con- sisting of oxygen, sulfur and nitrogen, with the exception of 2-furyl, 2-thienyl, 2-pyrrolyl, 2-N-methylpyrrolyl, 2,3-pyridyl, 2-thiolanyl, 2-perhydropyrrolyl and 2-perhydro-N-methylpyrrolyl, and if R2 and R3 are each hydrogen, further, R4 may also, if R2 and/or R3 are substituted by methoxy or methylthio, be phenyl which may carry the following groups: alkyl, haloalkyl, alkoxy, haloalkoxy, alkylthio, haloalkylthio, halogen, nitro or cyano; X is halogen, alkyl, haloalkyl, alkoxy, haloalkoxy, alkylthio or halo- alkylthio; Y is halogen, alkyl, haloalkyl, alkylthio, Y may also, if A is thienyl- ethyl, furylethyl or a bicyclic radical with the exception of naphthyl, quinolyl and isoquinolyl or R2 is trifluoromethyl, R3 is hydrogen and R4 is phenyl substituted as mentioned above, be alkoxy, C1-C3-alkoxy-C2-C3-alkoxy, or C1-C3-alkylthio-C2-C3-alkoxy, O.Z. 0050/42552 and Y may also be NR5R6, where R5 is hydrogen, alkyl, haloalkyl, alkoxy, alkoxyalkyl or cycloalkyl and R6 is hydrogen, except when R5 is methoxy and R4 is phenyl, or alkyl; and addition salts thereof with organic or inorganic acids.
Ditrich Klaus
Gerber Matthias
Hamprecht Gerhard
Walter Helmut
Westphalen Karl-Otto
Basf Aktiengesellschaft
Ditrich Klaus
Gerber Matthias
Hamprecht Gerhard
Robic
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