C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/298.1, 260/3
C07D 517/10 (2006.01) C07D 491/10 (2006.01) C07D 491/107 (2006.01) C07D 495/10 (2006.01) G03C 1/685 (2006.01)
Patent
CA 2028777
The present invention provides a spiropyran compound represented by the formula Image wherein R1 is alkyl having 1 to 20 carton atoms or aralkyl, R2, R3, R4 and R5 are the same or different and are each a hydrogen atom, alkyl having 1 to 6 carbon atoms, aryl or aralkyl, alkoxyl having 1 to 5 carbon atoms, halogen atom, cyano, trichloromethyl, trifluoromethyl or nitro, R6 and R7 are the same or different and are each a hydrogen atom, alkyl having 1 to 6 carbon atoms, aryl or aralkyl, halogen atom, cyano or nitro, X is an oxygen atom or sulfur atom, Y is Image Se or (CH3)2C<, Z is , and X is a sulfur atom when Y is (CH3)2C<, The spiropyran compound of the present invention itself is usable as a material such as recording material, photosensitive material, optical filter or decorative material. The present compound can further be homopolymerized or copolymerized with other polymerizable compound into a high polymer spiropyran compound for application to optical devices or dynamic devices.
Marks & Clerk
Otsuka Kagaku Kabushiki Kaisha
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