C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 215/48 (2006.01) A61K 31/16 (2006.01) A61K 31/40 (2006.01) A61K 31/47 (2006.01) A61K 38/05 (2006.01) C07C 237/06 (2006.01) C07C 237/20 (2006.01) C07C 237/22 (2006.01) C07C 237/48 (2006.01) C07C 255/29 (2006.01) C07C 255/41 (2006.01) C07C 271/22 (2006.01) C07C 271/24 (2006.01) C07C 275/42 (2006.01) C07C 275/62 (2006.01) C07C 317/14 (2006.01) C07C 323/58 (2006.01) C07D 207/16 (2006.01) C07D 209/42 (2006.01) C07D 213/56 (2006.01) C07D 213/82 (2006.01) C07D 215/54 (2006.01) C07D 215/56 (2006.01) C07D 233/5
Patent
CA 2062755
2062755 9100725 PCTABS00003 A CCK antagonist compound of formula (I) wherein G is (1) NH2 or (2) substituted amino; R9 is (1) hydrogen, (2) loweralkyl, (3) carboxy-substituted alkyl or (4) carboxyester-substituted alkyl; R10 is (1) hydrogen, (2) loweralkyl, (3) functionalized alkyl or (4) cycloalkyl; D is (1) hydrogen, (2) loweralkyl, (3) functionalized alkyl, (4) cycloalkyl, (5) aryl, (6) functionalized oxyalkyl or (7) heterocyclic; with the proviso that D is other than indolylmethyl, indolinylmethyl or oxindolylmethyl; or R10 taken together with D or R9 taken together with D forms a cyclic group; Z is (1) -C(O)-, (2) -C(S)- or (3) -S(O)2-; B is (1) absent, (2) alkylene, (3) alkenylene, (4) substituted alkenylene, (5) -R26-R27- wherein R26 is absent or -CH2- and R27 is -O-, -S-, -NH- or -N(loweralkyl)- or (6) -R27-CH2- wherein R27 is defined as above; and Ar is (1) aryl or (2) a heterocyclic group.
Abbott Laboratories
Goudreau Gage Dubuc
Kerwin James F. Jr.
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