Process for removing arsenic compounds from hydrogen fluoride

C - Chemistry – Metallurgy – 01 – G

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C01G 28/00 (2006.01) C01B 7/19 (2006.01)

Patent

CA 2351746

The invention relates to a novel process for removing arsenic compounds from the distillation bottoms from hydrogen fluoride distillation in which the distillation bottoms are first concentrated by evaporation of hydrogen fluoride until the temperature at the bottom is from 40 to 60°C, and the residue is then reacted with calcium hydroxide, calcium oxide, or a mixture thereof to give, in a simple manner, a product capable of disposal in a landfill.

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Process for removing arsenic compounds from hydrogen fluoride does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for removing arsenic compounds from hydrogen fluoride, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for removing arsenic compounds from hydrogen fluoride will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1778335

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.