Apparatus for depositing barrier film on three dimensional...

Details Apparatus for depositing barrier film on three dimensional... Apparatus for depositing barrier film on three dimensional...

C - Chemistry, Metallurgy

23

C

C23C 16/00 (2006.01) C23C 16/509 (2006.01) H01J 37/32 (2006.01)

Patent

CA 2214921

The invention relates to an apparatus for use in a Plasma Enhanced Chemical Vapor Deposition (PECVD) process whereby a coating of inorganic material is deposited on three-dimensional articles, including low melting temperature polymer articles. The coating possesses excellent gas and/or water vapor barrier properties.

L'invention porte sur un appareil destiné au procédé de dépôt chimique en phase vapeur activé par plasma (PECVD), permettant d'appliquer un revêtement de matière minérale sur des articles tri-dimensionnels, incluant des articles en polymères à bas point de fusion. L'effet barrière du revêtement pour les gaz et (ou) la vapeur d'eau est extrêmement efficace.

Affiliated with

Also associated with

Rating

Apparatus for depositing barrier film on three dimensional... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for depositing barrier film on three dimensional..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for depositing barrier film on three dimensional... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1784830