Epimerized derivatives of k5 polysaccharide with a very high...

C - Chemistry – Metallurgy – 08 – B

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C08B 37/00 (2006.01) A61K 31/726 (2006.01) A61K 31/727 (2006.01) A61K 31/737 (2006.01) C07H 1/00 (2006.01) C08B 37/08 (2006.01) C08B 37/10 (2006.01)

Patent

CA 2489862

A new method is described for the oversulfation of epiK5-N-sulfate to obtain an epiK5-amine-O-oversulfate with very high sulfation degree which, by subsequent N-sulfation, provides new epiK5-N,O-oversulfate-derivatives with a sulfation degree of at least 4, basically free of activity on the coagulation parameters and useful in the cosmetic or pharmaceutical field. Also described are new low molecular weight epiK5-N-sulfates useful as intermediates in the preparation of the corresponding LMW-epiK5-N,O-oversulfate-derivatives.

L'invention porte sur un nouveau procédé de sursulfatation de l'épiK5-N-sulfate pour obtenir de l'épiK5-amine-O-sursulfate à très fort degré de sulfatation, qui par une N-sulfatation subséquente donne de nouveaux dérivés d'épiK5-N,O-sursulfate, présentant un degré de sulfatation d'au moins 4, pratiquement exempt d'activité sur les paramètres de coagulation, et s'avérant utile dans les domaines cosmétiques et pharmaceutiques. L'invention porte également sur des épiK5-N-sulfates utiles comme intermédiaires dans la préparation de dérivés correspondants de LMW épiK5-N,O-sursulfate.

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Epimerized derivatives of k5 polysaccharide with a very high... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Epimerized derivatives of k5 polysaccharide with a very high..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Epimerized derivatives of k5 polysaccharide with a very high... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1786339

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.