C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 207/48 (2006.01) A61K 31/40 (2006.01) A61K 31/4025 (2006.01) A61K 31/404 (2006.01) A61K 31/4155 (2006.01) A61K 31/4439 (2006.01) A61K 31/5377 (2006.01) A61P 35/00 (2006.01) C07D 401/12 (2006.01) C07D 403/12 (2006.01) C07D 405/12 (2006.01) C07D 409/12 (2006.01) C07D 413/12 (2006.01) C07D 417/12 (2006.01)
Patent
CA 2599538
Compounds of a certain formula (I), in which R1 , R2, R3, R4, R5, R6 and R7 have the meanings indicated in the description, are novel effective HDAC inhibitors.
L~invention concerne des composés répondant à une formule (I), dans laquelle R1, R2, R3, R4, R5, R6 et R7 ont les significations indiquées dans la description, représentent de nouveaux inhibiteurs efficaces d~HDAC.
Baer Thomas
Beckers Thomas
Gekeler Volker
Leja Astrid
Maier Thomas
4sc Ag
Gowling Lafleur Henderson Llp
Nycomed Gmbh
LandOfFree
N-sulphonylpyrroles and their use as histone deacetylase... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with N-sulphonylpyrroles and their use as histone deacetylase..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and N-sulphonylpyrroles and their use as histone deacetylase... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1809343