Cluster tool soft etch module and ecr plasma generator therefor

Details Cluster tool soft etch module and ecr plasma generator therefor Cluster tool soft etch module and ecr plasma generator therefor

H - Electricity

01

L

H01L 21/306 (2006.01) H01J 37/32 (2006.01) H01L 21/20 (2006.01) H05H 1/46 (2006.01)

Patent

CA 2102201

2102201 9221136 PCTABS00017 An electron cyclotron resonance plasma generator (24) is provided in a semiconductor wafer plasma processing apparatus and cluster tool module (10), particularly for use in soft etching. The generator (24) generates a uniform plasma by rotating a plasma producing resonance supporting magnetic field about the axis (56) of a resonance cavity (26) within the vacuum chamber (16) of a plasma processor. The rotated field preferably is a single-cusp or multicusp field produced by a magnet assembly (60), preferably formed of a cylindrical array of bar magnets (70), mounted to rotate about the outside of the wall (35) of the cavity (26). Gas uniformly flows into and through the cavity from a gas distribution shower (48). Microwave energy is evenly divided and coupled into the cavity in a TM01 mode by a plurality of axially and radially aligned loops (55).

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