G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/027 (2006.01) G03F 7/033 (2006.01) G03F 7/12 (2006.01)
Patent
CA 2164670
A photosensitive resin composition is provided which is excellent in water developability, impact resilience, resin plate strength after exposure, breaking extension, and resin-plate transparency. The composition comprises: (1) a granular copolymer produced by polymerizing a monomer mixture comprising: (i) an aliphatic conjugated diene monomer; (ii) a monomer expressed by the general formula (I): Image ( I ) (in which R1 represents a hydrogen atom or a methyl group, R2 represents an alkylene group having a carbon number of 3 to 20, and Q represents an integer of 1 to 20); (iii) a monomer having at least two addition- polymerizable groups, and (iv) an addition-polymerizable monomer other than (i), (ii) and (iii), if desirable; (2) a photo-polymerizable unsaturated monomer; (3) an amino group-containing compound, and (4) a photo-polymerization initiator.
Kakiuchi Tadahiro
Kanda Kazunori
Koshimura Katsuo
Muramoto Hisaichi
Nishioka Takashi
Japan Synthetic Rubber Co. Ltd.
Kirby Eades Gale Baker
Nippon Paint Co. Ltd.
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