Slip free vertical rack design

H - Electricity – 01 – L

Patent

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Details

H01L 21/68 (2006.01) H01L 21/673 (2006.01)

Patent

CA 2218518

The present invention relates to a vertical rack for supporting a plurality of semiconductor wafers in a spaced, substantially horizontal, parallel relation, the vertical rack comprising: a) a vertical support means, and b) a plurality of vertically spaced, horizontal support means extending substantially horizontally from the vertical support means to define a plurality of support levels for supporting the wafers, wherein the horizontal support means are projections, each projection comprising an arm terminating in a wafer platform such that the innermost contact between at least one wafer platform of each support level and its supported wafer is in the region of between 20% and 80% of the wafer radius, measured from the edge of the wafer, and wherein the arm projects at a continuous upward incline and terminates in the wafer platform.

L'invention concerne un casier vertical conçu pour supporter plusieurs plaquettes en semi-conducteur espacées de manière sensiblement horizontale et parallèle. Ledit casier comprend: a) un moyen de support vertical, et b) plusieurs moyens de support horizontaux, espacés verticalement et s'étendant sensiblement horizontalement depuis le moyen de support pour définir une pluralité de niveaux de support des plaquettes, les moyens de support horizontaux étant des éléments saillants comprenant chacun une branche s'étendant jusqu'à un plateau à plaquettes de sorte que le contact le plus à l'intérieur entre au moins un plateau à plaquettes de chaque niveau de support et la plaquette supportée soit situé dans une zone de 20 à 80 % du rayon de la plaquette, en partant du bord de celle-ci, les branches s'étendant selon un plan incliné continu vers le haut jusque dans le plateau à plaquettes.

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