Method, system, and apparatus for gating configurations and...

H - Electricity – 01 – L

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

H01L 29/76 (2006.01)

Patent

CA 2589432

Methods, systems, and apparatuses for electronic devices having improved gate structures are described. An electronic device includes at least one nanowire. A gate contact is positioned along at least a portion of a length of the at least one nanowire. A dielectric material layer is between the gate contact and the at least one nanowire. A source contact and a drain contact are in contact with the at least one nanowire. At least a portion of the source contact and/or the drain contact overlaps with the gate contact along the nanowire the length. In another aspect, an electronic device includes a nanowire having a semiconductor core surrounded by an insulating shell layer. A ring shaped first gate region surrounds the nanowire along a portion of the length of the nanowire. A second gate region is positioned along the length of the nanowire between the nanowire and the substrate. A source contact and a drain contact are coupled to the semiconductor core of the nanowire at respective exposed portions of the semiconductor core.

La présente invention a trait à des procédés, des systèmes, et des appareils pour des dispositifs électroniques ayant des structures de grille améliorées. Un dispositif électronique comporte au moins un nanofil. Un contact de grille est positionné le long d'au moins une portion d'une longueur dudit au moins un nanofil. Une couche de matériau diélectrique se trouve entre le contact de grille et ledit au moins un nanofil. Un contact de source et un contact de drain sont en contact avec ledit au moins un nanofil. Au moins une portion du contact de source et/ou du contact de drain chevauche le contact de grille le long d'une portion de la longueur du nanofil. Dans un autre aspect, le dispositif électronique comporte un nanofil ayant un noyau semi-conducteur entouré d'une couche d'enveloppe isolante. Une première région de grille de forme annulaire entoure le nanofil le long d'une portion de la longueur du nanofil. Une deuxième région de grille est positionnée selon la longueur du nanofil entre le nanofil et le substrat. Un contact de source et un contact de drain sont reliés au noyau semi-conducteur du nanofil à des portions exposées respectives du noyau semi-conducteur.

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Method, system, and apparatus for gating configurations and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method, system, and apparatus for gating configurations and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method, system, and apparatus for gating configurations and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1873881

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.