Device and method for the surface treatment of substrates

H - Electricity – 01 – L

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H01L 21/00 (2006.01) B05C 1/08 (2006.01)

Patent

CA 2632897

The invention relates to a device for treating the surfaces of silicon wafers, comprising transport rollers for transporting the silicon wafer, and at least one conveyor device which wets the surface of the silicon wafer with an aqueous medium on a transport plane which is determined by the transport rollers. The conveyor device is configured such that it can apply the process medium to the surface of the silicon wafer, which is oriented in a downward manner and which is arranged on the transport plane. Several suction pipes for suctioning gaseous and/or mist-like distributed process mediums from the area surrounding the conveyor device are provided. The suction pipes are arranged in the vertical direction below the transport plane.

L'invention concerne un dispositif de traitement de surface de tranches de silicium, ce dispositif comportant des rouleaux transporteurs pour déplacer la tranche de silicium et au moins une installation de transport conçue pour le mouillage d'une surface de la tranche de silicium au moyen d'un agent de traitement liquide sur un plan de transport déterminé par les rouleaux transporteurs, l'installation de transport étant configurée pour l'application de l'agent de traitement sur une surface de la tranche de silicium tournée vers le bas et placée sur le plan de transport. Plusieurs tuyaux d'aspiration aspirent l'agent de traitement réparti sous forme de gaz et/ou de brouillard hors de l'environnement de l'installation de transport, ces tuyaux d'aspiration étant disposés à la verticale sous le plan de transport.

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