C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
C08G 77/20 (2006.01) C07F 7/18 (2006.01) C08G 77/38 (2006.01) C08L 83/06 (2006.01) C09D 183/07 (2006.01)
Patent
CA 2061681
ORGANOSILICON COMPOUNDS CONTAINING ALKENYL GROUPS, PROCESS FOR THEIR PREPARATION AND USE OF THE SAME Abstract of the Disclosure Organosilicon compounds containing alkenyl groups and com- prising average units of the formula (I), Image in which R may be the same or different and are selected from monovalent hydrocarbon radicals having from 1 to 18 carbon atom(s) per radical and monovalent halogenated hydrocarbon radicals having from 1 to 18 carbon atom(s) per radical, R1 may be the same or different and is selected from alkyl radicals having from 1 to 8 carbon atom(s) per radical and alkyl radicals having from 1 to 8 carbon atom(s) per radical, which are substituted by one or more ether oxygen atom(s), a is 0 or 1, with an average of from 0.003 to 1.0, b is 0, 1, 2 or 3, with an average of from 0.0 to 3.0, c is 0, 1, 2 or 3, with an average of from 0.0 to 3.0, and the sum a+b+c ?4, with an average of from 1.5 to 4.0, with the proviso that each molecule contains at least one radical A, and A is a radical of the formula Image in which R2 is the same or different and is an alkylene radical having from 1 to 4 carbon atom(s), R3 is the same or different and is a hydrogen atom or a methyl radical, R4 is the same or differ- ent and is a hydrogen atom or a methyl or ethyl radical, R5 is the same or different and is an alkylene radical having from 1 to 4 carbon atom(s), v is 0 or an integer and w is 0 or an integer, with the proviso that the radical A contains at least one spacer - (R5O)-, and x is 0 or 1 and y is 0 or 1, with the proviso that the sum x+y is 1 or 2.
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Wacker-Chemie G.m.b.h.
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