C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
C08F 6/00 (2006.01) C02F 3/34 (2006.01) C08L 33/26 (2006.01)
Patent
CA 2335985
The present invention discloses methods for the removal of an unwanted amide monomer compound from a polyamide or polymerized amide preparation at a pH of about 2 to less than 6, by conversion of the amide monomer compound to the corresponding acid compound using a pure culture of an induced microorganism strain capable of converting an amide moiety to an acid moiety.
La présente invention se rapporte à des procédés permettant d'extraire un composé monomère d'amide indésirable d'une préparation de polyamide ou d'amide polymérisé à un pH compris approximativement entre 2 et 6. Lesdits procédés consistent à convertir le composé monomère d'amide en un composé d'acide correspondant au moyen d'une culture pure d'une souche de micro-organismes induits susceptibles de convertir une fraction amide en une fraction acide.
Cytec Technology Corp.
Smart & Biggar
LandOfFree
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