C - Chemistry – Metallurgy – 08 – L
Patent
C - Chemistry, Metallurgy
08
L
400/5135, 400/54
C08L 59/00 (2006.01) C08L 59/02 (2006.01) C08L 59/04 (2006.01) C08L 75/04 (2006.01) C08L 75/06 (2006.01) C08L 75/08 (2006.01) C08L 71/02 (2006.01)
Patent
CA 2027220
ABSTRACT OF THE DISCLOSURE A high impact resistant polyacetal resin composition which further has excellent antistatic properties comprises (a) a polyacetal comprising at least 50% oxymethylene units, (b) a low molecular weight elastomeric polyester- or polyether-based polyurethane, and (c) an antistatic agent comprising a polyhydric alcohol fatty acid ester which contains a hydroxyl group and a polyethylene glycol.
Hoechst Celanese Corporation
Kusumgar Rajal M.
Smart & Biggar
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