Selective removal of material by irridiation

B - Operations – Transporting – 08 – B

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B08B 7/00 (2006.01) B23K 26/00 (2006.01) B23K 26/36 (2006.01) G03F 7/20 (2006.01) H01L 21/306 (2006.01) H01L 21/3205 (2006.01) H01L 21/321 (2006.01) H01L 21/768 (2006.01)

Patent

CA 2200199

An apparatus and method for selectively removing undesired material from the surface of a substrate provides a flow of inert gas over the undesired material susbtrate surface while irradiating the undesired material with energetic photons. The invention enables removal of undesired material without altering the physical properties of the material underlying or adjacent the removed, undesired material. The invention can be applied to produce changes in surface topography (including nano-structuring and surface planarization).

Appareil et procédé d'élimination sélective de matériaux indésirables de la surface d'un substrat consistant à diriger un flux d'un gaz inerte sur la surface dudit substrat tout en irradiant les matériaux indésirables par des photons énergétiques. L'invention permet ladite élimination sans altérer les propriétés physiques des matériaux se trouvant sous ou à côté de la zone où se trouvent les matériaux indésirables à éliminer. On peut utiliser l'invention pour modifier la topographie de surfaces (y compris pour la nanostructuration et l'aplanissement de surfaces).

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Profile ID: LFCA-PAI-O-1991738

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