C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 7/08 (2006.01) C07C 69/716 (2006.01) C07C 69/738 (2006.01) C08F 2/50 (2006.01) C08L 83/06 (2006.01)
Patent
CA 2416325
Compounds of formula Ia, Ib and Ic, (Ic), in which R, R1 and R2 are e.g. phenyl, naphthyl, anthracyl, phenanthryl or a heterocyclic radical, are suitable as photoinitiators which accumulate at the surface of coatings.
L'invention concerne des composés des formules (Ia), (Ib) et (Ic), dans lesquelles R, R¿1? et R¿2? sont, par exemple, phényle, naphtyle, anthracyle, phénanthryle ou un radical hétérocyclique. Ces composés conviennent comme photoamorceurs qui s'accumulent à la surface de revêtements.
Baudin Gisele
Jung Tunja
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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