Chemically patterned hydrogels, manufacture and use thereof

C - Chemistry – Metallurgy – 07 – D

Patent

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Details

C07D 311/58 (2006.01) C08J 3/075 (2006.01) C08J 3/28 (2006.01) C08K 5/205 (2006.01) C08K 5/37 (2006.01) C08L 101/02 (2006.01) G01N 33/50 (2006.01)

Patent

CA 2584087

A chemically patterned modified hydrogel formed from a modified hydrogel is provided. The hydrogel is conjugated with a multiphoton photocleavable molecule. The molecule has a multiphoton-labile protective group and a protected group. The protective group is cleavable upon multiphoton excitation to deprotect the protected group, without substantial polymerization of the hydrogel. The chemically patterned modified hydrogel is formed by exposing the modified hydrogel to multiphoton excitation to deprotect a portion of the protected groups.

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