C - Chemistry – Metallurgy – 08 – J
Patent
C - Chemistry, Metallurgy
08
J
C08J 3/28 (2006.01) B29C 59/16 (2006.01)
Patent
CA 2509701
Etching the surface (activating the surface) of a halogenated polymer component with an electron beam generates a set of free radical sites in polymeric chains of the surface that sustain for at least 4 hours in an inert environment. The inert environment is provided by a noble gas, nitrogen, a static free space, and/or a vacuum. Items such as dynamic seals, static seals, gaskets, pump diaphragms, hoses, and o-rings all benefit from precursors made according to the technique.
Freudenberg-Nok General Partnership
Macrae & Co.
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