Colloidal silica dispersion

C - Chemistry – Metallurgy – 01 – B

Patent

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Details

C01B 33/159 (2006.01) C01B 33/14 (2006.01) C01B 33/148 (2006.01) C01B 33/149 (2006.01) C01B 33/157 (2006.01) C01B 33/18 (2006.01) C09C 1/30 (2006.01)

Patent

CA 2501409

The invention relates to a method of producing a stable substantially aqueous silanized colloidal silica dispersion having a silica content of at least about 20 wt%, comprising mixing at least one silane compound and colloidal silica particles, wherein the weight ratio of silane to silica is from about 0.003 to about 0.2. The invention also relates to a dispersion obtainable by the method, and to a stable substantially aqueous silanized colloidal silica dispersion having a silica content of at least about 20 wt%, wherein the weight ratio of silane to silica is from about 0.003 to about 0.2. The invention further concerns the use of the dispersion for coatings applications and as an additive.

L'invention concerne un procédé de production d'une dispersion aqueuse de silice colloïdale silanisée sensiblement stable ayant une teneur en silice d'au moins 20 % en poids, procédé consistant à mélanger au moins un composé silane avec des particules de silice colloïdale, le rapport pondéral silane/silice étant compris entre environ 0,003 et environ 0,2. L'invention concerne également une dispersion obtenue par le procédé précité, ainsi qu'une dispersion aqueuse de silice colloïdale silanisée sensiblement stable, ayant une teneur en silice d'au moins environ 20 % en poids, avec un rapport pondéral silane/silice d'environ 0,003 à environ 0,2. L'invention concerne en outre l'utilisation de la dispersion précitée comme revêtement et comme additif.

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