Positive resist composition

Details Positive resist composition Positive resist composition

G - Physics

03

F

G03F 7/022 (2006.01) G03F 7/039 (2006.01)

Patent

CA 2102148

ABSTRACT OF THE DISCLOSURE According to the present invention, there is provided the following positive resist composition which is excellent in properties such as resolution, profile, depth of focus, etc. and free from scum: a positive resist composition comprising (a) a novolac resin obtained through a condensation reaction of an aldehyde compound and a mixture of phenol compounds comprising m-cresol, p-cresol and 2,5-xylenol, (b) a light-sensitive quinonediazide material containing the quinonediazidesulfonic acid diester of the compound having not less than three phenolic hydroxyl groups in an amount of 40% or more as expressed in terms of pattern area measured by high performance liquid chromatography, and (c) an alkali-soluble compound having a molecular weight of lower than 900.

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