Flexural plate wave sensor and array

G - Physics – 01 – N

Patent

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Details

G01N 29/02 (2006.01) G01N 9/00 (2006.01) G01N 29/22 (2006.01) H01L 21/02 (2006.01)

Patent

CA 2404137

A method for manufacturing a flexural plate wave sensor includes the steps of depositing an etch-stop layer (34) over a substrate (32), depositing a membrane layer (36) over the etch stop layer, depositing a piezoelectric layer (38) over the membrane layer, forming a first transducer (44) on the piezoelectric layer and forming a second transducer (48) on the piezoelectric layer, spaced from the first transducer. The method further includes the steps of etching a cavity (52) through the substrate, the cavity having substantially parallel interior walls (54a, 54b), removing the portion of the etch stop layer between the cavity and the membrane layer to expose a portion (53) of the membrane layer, and depositing an absorptive coating (56) on the exposed portion of the membrane layer.

L'invention porte sur un procédé de fabrication d'un détecteur de longueur d'onde à plaque flexible comportant les étapes suivantes: dépôt d'une couche de limitation de morsure (34) sur un substrat (32); dépôt d'une couche membrane (36) sur la couche de limitation de morsure; dépôt d'une couche piézo-électrique (38) sur la couche membrane; formation d'un premier transducteur (44) sur la couche piézo-électrique; formation d'un deuxième transducteur (48) séparé du premier sur la couche piézo-électrique; attaque dans le substrat d'une cavité (52) dont les parois intérieures (54a, 54b) sont sensiblement parallèles; élimination de la couche d'arrêt de morsure séparant la cavité de la couche membrane pour en exposer une partie (53); et dépôt d'un revêtement absorbant (56) sur la partie exposée de la couche membrane.

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