C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/241.2
C07D 413/06 (2006.01) A61K 31/535 (2006.01) A61K 31/55 (2006.01) C07D 223/14 (2006.01) C07D 223/22 (2006.01) C07D 223/24 (2006.01) C07D 233/14 (2006.01) C07D 265/30 (2006.01)
Patent
CA 1064924
NOVEL TRICYCLIC COMPOUNDS Abstract of the Disclosure: Novel tricyclic compounds of the formula: Image wherein A is -CH2-CH2-, -CH=CH- or Image , X is hydrogen, halogen, nitro, trifluoromethyl, C1-C3 alkyl or C1-C3 alkoxy, R1 and R2 are each hydrogen or C1-C4 alkyl and R3 is hydrogen, C1-C4 alkyl, C3-C5 alkenyl, C3-C5 alkynyl, C3- C6 cycloalkyl(C1-C3)alkyl, ar(C1-C3)alkyl, polyhalo(C1- C2)alkyl, C1-C4 alkoxy(C1-C3)alkyl or hydroxy(C1-C3)alkyl, and non-toxic salts thereof which are useful as anti- depressants and can be prepared by reduction of a compound of the formula: Image wherein A, X, R1, R2 and R3 are each as defined above. - 1 -
241209
Katsube Junki
Maruyama Isamu
Takashima Yoshinori
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