Photopolymerizable composition containing an...

C - Chemistry – Metallurgy – 08 – F

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

402/374, 402/4,

C08F 2/50 (2006.01) C08G 59/68 (2006.01) C08G 65/10 (2006.01) C08G 75/08 (2006.01) C08J 3/24 (2006.01) C08K 5/00 (2006.01) C08L 61/00 (2006.01) G03F 7/029 (2006.01)

Patent

CA 1126435

ABSTRACT Photopolymerisable compositions capable of polymerisation by an acid-catalysed mechanism under the influence of ultraviolet and/or visible light comprise (a) at least one material capable of polymerisation by an acid-catalysed mechanism to a polymeric material of higher molecular weight state, (b) a photosensitive aromatic sulphonium salt and (c) a material which under the conditions of photopolymerisation will yield a significant proportion of free radicals. These compositions yield useful coating films and other products on irradiation.

338280

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Photopolymerizable composition containing an... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photopolymerizable composition containing an..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photopolymerizable composition containing an... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-22390

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.