Enhancing the resistance of resists of plasma etching

Details Enhancing the resistance of resists of plasma etching Enhancing the resistance of resists of plasma etching

H - Electricity

01

L

148/3.2

H01L 21/08 (2006.01) G03F 7/40 (2006.01)

Patent

CA 1140840

PROCESS FOR FORMING MICROCIRCUITS Abstract of the Disclosure The resistance of a resist to plasma etching is enhanced by first cross-linking the resist and then contacting it with an aqueous solution of NaOH or KOH. The process is useful to form microcircuits having increased density of geometry. SA9-78-060X

348727

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