Photopolymerisable resins

Details Photopolymerisable resins Photopolymerisable resins

C - Chemistry, Metallurgy

08

G

402/166, 96/172,

C08G 59/28 (2006.01) G03C 1/74 (2006.01)

Patent

CA 1114548

ABSTRACT OF THE DISCLOSURE The resins are diepoxides of the formula Image where a is an integer of average value from 1 to 100, each R and R1 represents a group Image or -O-(OC)c-R5-(CO)c-O-, each R2 represents -H or a group -(CH2NH)dCOC(R6)=CH2, at least one of the 2a groups R2 representing -(CH2NH)dCOC(R6)=CH2, each R3 denotes a lower alkyl group, or conjointly each pair represents a group of formula -CH2CH2-, -C(R7R8)CO-, Image -CH2CH2CH2-, -COCO-, -COCOCO-, or -COC(OH)2CO-, R4 represents a divalent aliphatic, cycloaliphatic, or araliphatic radical, b, c, and d are each zero or 1, R5 represents a straight or branched chain aliphatic group or, providing c is 1, it may alternatively represent a group Image , R6 represents -H or a lower alkyl group, and R7 and R8 each represent -H, -CH3, or -C2H5. The resins are water-soluble, but, on exposure to actinic radiation polymerise and become insoluble: images of the polymerised resin may therefore be developed with water.

274444

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