Polyphosphazene copolymers containing unsaturated...

C - Chemistry – Metallurgy – 08 – G

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402/340, 402/355

C08G 79/02 (2006.01) C07F 9/65 (1980.01)

Patent

CA 1124255

ABSTRACT OF THE DISCLOSURE Polyphosphazene copolymers are prepared which contain randomly distributed repeating units represented by the formulas: Image Image and- Image wherein X is an unsaturated radical represented by the formulas: - O?=CH2 or - o - ? = ? R2 I wherein R is an alkyl group containing from 1 to 12 carbon atoms or arylt wherein R1, R2 and R3 arc independently selected from the group consisting of hydrogen, substituted and unsubstituted alkyl radicals containing from 1 to 15 carbon atoms, substituted and unsubstituted cycloalkyl, aryl, arylalkyl, and heterocyclic radicals; wherein X' is selected from the group consisting of substituted or unsubstituted alkoxy, aryloxy, amino and mercapto groups and wherein 20<(a+b+c)<50,000 per polymer. The polyphosphazene copolymers of the invention aro prepard by reacting the enol or enolate form of a pyruvate ester or the enol form of an aldehyde or ketone and an additional reactant such as an aliphatic or aromatic alcohol, a mercaptan or an amine compound with poly(dichloro- phosphazene) in the presence of a tertiary amine. The copolymers may be modified by crosslinking or curing. The copolymers of the invention can be utilized to form solvent resistant protective films and may also be utilized in applieations for moldings, coatings and the like. Additionally, the copolymers may be utilized as crosslinking agents for other reactive monomers or polymers. An especially useful feature of copolymers containing substituents derived from pyruvate esters is that they can be cured or crosslinked at room temperature.

333927

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