C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
260/446.6, 260/4
C07F 7/18 (2006.01) C07D 307/89 (2006.01)
Patent
CA 1124736
Abstract The invention relates to Si-modified phthalic acid derivatives (acids, esters and anhydrides) of the formula I (I) Image in which R1 and R2 independently of one another are -OH, alkoxy with 1-12 C atoms or phenoxy or R1 and R2 together are the -O- group, X is a Image or Image group, R3 is alkyl with 2-7 C atoms, cycloalkyl wltb 5-7 C atoms, benzyl or Image Q is methyl, phenyl or -OQ3 and Q1, Q2 and Q3 independently of one another are alkyl with 1-6 C atoms or phenyl. The products of the invention are prepared by re- acting the corresponding allylamino-phthalic anhydrides or allylamino-phthalic acid esters with compounds of the formula III Image (III) They are used as adhesion promoters, for example between inorganic solids and organic resins. They may also be used for the preparation of other Si-modified adhesion promoters, and as curing agents for epoxide resins.
310792
Darms Roland
Greber Gerd
Wyler Siegfried
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
LandOfFree
Silicon-modified phthalic acid derivatives does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Silicon-modified phthalic acid derivatives, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silicon-modified phthalic acid derivatives will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-367485