Workpiece positioning apparatus

Details Workpiece positioning apparatus Workpiece positioning apparatus

C - Chemistry, Metallurgy

04

B

269/31

C04B 41/00 (2006.01) B23Q 1/62 (2006.01) B23Q 11/08 (2006.01) B28D 7/04 (2006.01) H01L 21/68 (2006.01)

Patent

CA 1037506

ABSTRACT Disclosed is an X-Y table for positioning semicon- ductor workpieces in a vacuum environment with a high degree of speed and accuracy. The X and Y prime movers are mounted on adjacent external surfaces of the vacuum chamber. The first motor associated with the drive in the Y direction seals with an "O" ring onto the front surface of the chamber. A second motor associated with the X drive is fixably mounted to one of the sides of the chamber. The lower stage pro- viding motion in the Y direction has a single degree of freedom relative to the vacuum chamber. The upper stage providing motion in the X direction is connected to the lower Y stage and has two degrees of freedom relative to the vacuum chamber. The entire X-Y table assembly is mounted on rails in parallel with the Y direction of motion such that by removing the front wall of the vacuum chamber, the entire assembly may be removed for repair and/or maintenance. By such modular replacement, the entire E-beam tool can resume operation.

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