C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/108.2
C07D 501/18 (2006.01) C07D 499/10 (2006.01) C07D 499/42 (2006.01) C07D 501/04 (2006.01) C07D 501/60 (2006.01) A61K 31/545 (2006.01)
Patent
CA 1102791
Abstract of disclosure Cephem compounds of the formula: Image , wherein R2 is hydrogen or an ester residue, or salts thereof are produced in low production cost and excellent yields by a method comprising silylating a compound of the formula: Image , wherein R1CO is an acyl group and R2 has the same meaning as defined above, halogenating the silylated compound, reacting the iminohalide with a lower alcohol and subjecting the resultant iminoether compound to solvolysis.
302003
Nishimura Tatsuo
Tsushima Susumu
Fetherstonhaugh & Co.
Takeda Chemical Industries Ltd.
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