C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/293, 260/325
C07C 127/00 (1980.01) C07C 129/00 (1980.01)
Patent
CA 1072962
ABSTRACT The invention describes a novel class of chemical compounds of the formula I or its tautomeric form II when the R radical is hydrogen: Image Image I II where X, Y and Z may be the same or different and are hydrogen, halo, loweralkyl, haloloweralkyl, nitro loweralkoxy, hydroxy, arloweralkoxy, acyloxy, cyano, haloloweralkoxy or loweralkyl- sulfonyl; R and R' are hydrogen or loweralkyl, R" and R''' are hydrogen, loweralkyl, loweralkenyl, cycloalkenyl up to 9 carbon atoms, cycloalkylloweralkyl, loweralkyl, cycloalkyl, aralkyl or loweralkynyl; R" and R''' together may form a 5-7 atom ring which may include 0-2 heteo atoms of N, O or S; Rn is hydrogen or loweralkyl provided at least one of R, R', R" and R''' is other than hydrogen; and non-toxic acid addition salts thereof. The novel compounds of the invention have valuable spasmolytic (anti-diarrheal), local anaesthetic, anti-arrhythmic and anti- secretory properties.
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