C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
96/155, 96/266
C08F 2/50 (2006.01) G03F 7/027 (2006.01)
Patent
CA 1103084
ABSTRACT OF THE DISCLOSURE A photopolymerizable coating composition comprising (1) a nongaseous, ethylenically unsaturated, polymerizable compound, (2) a specified nitroaromatic compound, and (3) an organic radiation-sensitive, free-radical generating system is useful for making a positive or negative polymeric image on a substrate.
273994
E. I. Du Pont de Nemours And Company
Mccallum Brooks & Co.
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