C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/552.1, 260/5
C07C 49/76 (2006.01) C07C 69/95 (2006.01) C07C 103/80 (1980.01)
Patent
CA 1081706
Abstract of the Disclosure Disclosed herein is a polymer comprising A. from about 1 to 100% by weight of a polymerized monomer containing at least one active methylene group and having the formula Image wherein n is 0 or 1, R is hydrogen or methyl, R' is substituted or unsubstituted arylenethylene having the structure Image , wherein Ar is arylene, R2 is hydrogen. alkyl, aryl. or cycloalkyl. R3 is alkoxy or amino when n is equal to 0, and R3 is alkyl, alkoxy, amino. cycloalkyl or aryl when n is equal to 1; and B. from 0 to about 99% by weight of at least one additional polymerized ethylenically unsaturated monomer. The polymers are useful as binding agents in photographic elements.
313560
Eastman Kodak Company
Gowling Lafleur Henderson Llp
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