C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/267.2
C07D 295/04 (2006.01)
Patent
CA 1088537
Abstract New compounds and the pharmaceutically acceptable acid addition salts thereof, which are useful hypotensive agents, have the structure Image wherein R1 is hydrogen, Image wherein X is alkyl of 1 to 12 carbon atoms or aryl, or Image wherein Y is lower alkyl or aryl; R2 is hydrogen, halogen, lower alkyl, hydroxy, alkoxy or Image ; R3 is hydrogen, halogen, lower alkyl, alkoxy alkyl- thio, trifluoromethyl or nitro; and n is 1, 2 or 3 wherein the terms lower alkyl, alkoxy and alkylthio refer to groups having 1 to 4 carbon atoms and the term aryl refers to phenyl or phenyl monosubstituted with lower alkyl, alkoxy or halogen.
260395
Condon Michael E.
Hauck Frederic P.
Reid Joyce A.
E. R. Squibb & Sons Inc.
Osler Hoskin & Harcourt Llp
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