Polyphosphazene polymers containing cyclic ketal substituents

C - Chemistry – Metallurgy – 08 – G

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402/319, 402/33,

C08G 79/04 (2006.01) C08G 79/02 (2006.01) C08L 85/02 (2006.01)

Patent

CA 1134840

ABSTRACT OF THE DISCLOSURE Polyphosphazene polymers are prepared which contain repeat- ing units represented by the formulas: Image wherein X is represented by Image wherein R1 and R2 are independently selected from a group consisting of substituted or unsubstituted alkphatic, aryl, araryl, alkylaryl and heterocyclic radicals or R1 and R2 can be linked to form a cyclic radical and R3 is an aliphatic hydrocarbon radical or hydrogen, X' is a substituted or unsubstituted alkoxy, aryloxy, amino or mercapto substituent group or mixtures thereof which are compatible with an N-substituted amino substituent and are known in the state of the art of polyphosphazene technology; and 20 ? (w + y +z) ? 50,000 per polymer and (y + z) > 0. The polymers of the invention can be utilized to form protective films and can also be utilized in applications such as molding, coatings, foams and the like.

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