Polyphosphazene copolymers containing a substituent bonded...

C - Chemistry – Metallurgy – 08 – G

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402/2, 402/355,

C08G 79/02 (2006.01)

Patent

CA 1133497

ABSTRACT OF THE DISCLOSURE Polyphosphazene copolymers are prepared which contain randomly distributed units represented by the formulas: Image wherein X is a -CR(CN)2 radical or a -CNO2R1R2 radical or a sulfone radical selected from the group consisting of -CR4R5-SO2-R3 and Image , in which R is H, a branched chain, a straight chain or cyclic alkyl group containing from 1 to 12 carbon atoms or an aryl group or mixtures thereof, R1 and R2 are H, a branched, straight chain or cyclic alkyl group containing from 1 to 12 carbon atoms or mixtures thereof, R3 is alkyl containing from 1 to 12 carbon atoms, cycloalkyl containing from 3 to 12 carbon atoms or aryl and R4 and R5 are individually selected from the group consisting of hydrogen, alkyl radicals containing from 1 to 11 carbon atoms and aryl radicals, wherein X' is an organic radical selected from the group consisting of substituted or unsubstituted alkoxy, alkenyloxy, aryloxy, alkenylaryloxy, amino and mercapto groups and wherein 20 ? (a+b+c) ? 50,000 per polymer. In the copolymer units represented by the above formulas, all X substituent groups may be the same or they may be mixed and all X' substituent groups may be the same or mixed. In the mixtures, the X substituent groups may be mixtures of different -CR(CN)2 groups, different -CNO2R1R2 groups or different sulfone groups and the X' substituent groups may be mixtures of alkoxy, alkenyloxy, aryloxy, alkenylaryloxy, amino and mercapto groups or mixtures within each group. The copolymers of the inven- tion can be utilized to form protective films and may also be utilized in applications such as for moldings, coatings, and the like where heat stability and solvent resistance are important.

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