Process for the purification of hexamethyldisiloxane and...

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6/218, 260/445,

B01D 3/36 (2006.01) C07F 7/20 (2006.01)

Patent

CA 1166405

ABSTRACT OF THE DISCLOSURE: The present invention relates to a process for the purification of hexamethyldisiloxane, which is rendered impure by toluene or other solvent which may not be completely separated distillatively from hexamethyldisiloxane. The process may also be used in like manner for purification of hexamethyldisiloxane which is rendered impure by other sub- stances. It is based upon the fact that hexamethyldisiloxane forms with acetonitrile a hitherto unknown azeotrope. This azeotrope forms a heavier acetonitrile-rich phase and a lighter hexamethyldisiloxane-rich phase, which are not miscible with one another. This azeotrope boils already at 71.4°C and makes possible in this way separation of hexamethyl- disiloxane from its impurities at relatively low temperatures. Moreover one or more entraining distillations are carried out in the presence of excess acetonitrile and the acetonitrile is again separated off distillatively from the lighter phase thus produced. In addition to the above indicated azeotrope systems there is also provided an azeotrope system of hexamethyl- disiloxane and toluene as ?ell as a further one of acetonitrile and toluene. All three azeotrope systems are likewise the subject of the present invention.

397557

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