Dual focused resistivity logging method and apparatus

G - Physics – 01 – V

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

324/10

G01V 3/06 (2006.01) G01V 3/24 (2006.01)

Patent

CA 1126814

DUAL FOCUSED RESISTIVITY LOGGING METHOD AND APPARATUS Abstract of the Disclosure Method and apparatus for reducing the dynamic range of measure signals encountered in simultaneously ob- taining two focused logs of formation resistivity with different depths of investigation and means for providing the required electrical connections of the electrode system. The apparatus includes an electrode system having a central electrode, a near and far pair of current electrodes, respectively shortcircuited, and aligned symmetrically on both sides of the central electrode, and a near and far pair of measure electrodes, respectively shortcircuited, and aligned symmetrically between the central electrode and the near pair of current electrodes. A signal detected on the near measure electrode pair at a preselected frequency and a first and second signal are combined to produce first and second combined voltages which are used in the production of a first and second frequency, f1 and f2, respectively. Elec- trode drive signals, each at a different, preselected frequency are generated, each having an amplitude functionally related to the deep resistivity measure signal with the frequencies selected to permit simultaneous measurement in a borehole of the electrical resistivities of the subsurface earth forma- tions over relatively small and relatively large lateral distances from the wall of the borehole. The varying ampli- tude of the electrode drive signals acts to reduce the dynamic ranges in the measured currents and voltages im- pressed across the formation permitting an increase in the measurement accuracy over a smaller measurement range.

340138

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Dual focused resistivity logging method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dual focused resistivity logging method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dual focused resistivity logging method and apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-821843

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.