Glow discharge etching process for chromium

Details Glow discharge etching process for chromium Glow discharge etching process for chromium

H - Electricity

01

L

204/96.05

H01L 21/3213 (2006.01) C23F 4/00 (2006.01)

Patent

CA 1120888

GLOW DISCHARGE ETCHING PROCESS FOR CHROMIUM Abstract of the Disclosure Chromium is etched in a glow discharge without attack on Al/Cu, Si, SiO2, and Si3N4 layers by etching in a low pressure ambient atmosphere containing a poly- chlorinated organic compound such as CC14, water, and a material selected from the group consisting of the noble gases and oxygen. FI 9-78-030

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