Tricyclic compounds

C - Chemistry – Metallurgy – 07 – D

Patent

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260/241.2

C07D 413/06 (2006.01) C07D 223/24 (2006.01) C07D 265/30 (2006.01)

Patent

CA 1068691

NOVEL TRICYCLIC COMPOUNDS Abstract of the Disclosure Novel tricyclic compounds of the formula: Image wherein A is -CH2-CH2-, -CH=CH- or Image , X is hydrogen, halogen, nitro, trifluoromethyl, C1-C3 alkyl or C1-C3 alkoxy, R1 and R2 are each hydrogen or C1-C4 alkyl and R4 is C1-C4 alkyl, C3-C5 alkenyl, C3-C5 alkynyl, C3-C6 cycloalkyl- (C1-C3)alkyl, ar(C1-C3)alkyl, polyhalo- (C1-C2)alkyl or C1-C4 alkoxy(C1-C3)alkyl and non-toxic salts thereof which are useful as anti- depressants and can be prepared by reacting a compound of the formula: Image wherein A and X are each as defined above, with a compound of the formula: Image - 1 - wherein R1, R2 and R4 are each as defined above and Y is halogen or sulfonyloxy, in an inert solvent in the presence of a base. - 2 -

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