C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/241.2
C07D 413/06 (2006.01) C07D 223/24 (2006.01) C07D 265/30 (2006.01)
Patent
CA 1068691
NOVEL TRICYCLIC COMPOUNDS Abstract of the Disclosure Novel tricyclic compounds of the formula: Image wherein A is -CH2-CH2-, -CH=CH- or Image , X is hydrogen, halogen, nitro, trifluoromethyl, C1-C3 alkyl or C1-C3 alkoxy, R1 and R2 are each hydrogen or C1-C4 alkyl and R4 is C1-C4 alkyl, C3-C5 alkenyl, C3-C5 alkynyl, C3-C6 cycloalkyl- (C1-C3)alkyl, ar(C1-C3)alkyl, polyhalo- (C1-C2)alkyl or C1-C4 alkoxy(C1-C3)alkyl and non-toxic salts thereof which are useful as anti- depressants and can be prepared by reacting a compound of the formula: Image wherein A and X are each as defined above, with a compound of the formula: Image - 1 - wherein R1, R2 and R4 are each as defined above and Y is halogen or sulfonyloxy, in an inert solvent in the presence of a base. - 2 -
320561
Katsube Junki
Maruyama Isamu
Takashima Yoshinori
LandOfFree
Tricyclic compounds does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Tricyclic compounds, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Tricyclic compounds will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-872869