Photopolymerizable compositions based on acrylic or...

Details Photopolymerizable compositions based on acrylic or... Photopolymerizable compositions based on acrylic or...

Category

C - Chemistry, Metallurgy

Subcategory

08

Subsubcategory

F

CPC

402/451, 402/466

IPC codes

C08F 20/20 (2006.01) C08F 2/50 (2006.01) G03C 1/68 (1980.01)

Type

Patent

Patent number

CA 1121548

Description

ABSTRACT OF THE DISCLOSURE An improved photopolymerizable composition based on acrylic or methacrylic acid esters is disclosed. In addition to the mono- or polyfunctional acrylic or methacrylic acid ester compounds, an aliphatic, aromatic or mixed aliphatic- aromatic organic phosphite compound (in an amount of from about 0.1 to 20 percent by weight of the photopolymerizable ester compounds) and a monoketal of an aromatic 1,2-diketone compound (e.g., benzildimethylketal) are included as ultraviolet initiators to dramatically reduce the polymerization time of the composition without adversely affecting its stability.

Application Number

298995

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