Process for preparing electron beam resists

Details Process for preparing electron beam resists Process for preparing electron beam resists

C - Chemistry, Metallurgy

08

F

96/172, 402/364,

C08F 8/32 (2006.01) G03F 7/039 (2006.01)

Patent

CA 1078548

PROCESS FOR PREPARING ELECTRON BEAM RESISTS Abstract of the Disclosure Positive electron beam resists are prepared by reacting a film which is a copolymer of methyl methacrylate and methacrylic acid with a tertiary amine.

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