Amorphous low-retentivity alloy

Details Amorphous low-retentivity alloy Amorphous low-retentivity alloy

C - Chemistry, Metallurgy

22

C

75/1.1

C22C 29/00 (2006.01) C22C 45/04 (2006.01) H01F 1/153 (2006.01)

Patent

CA 1166042

ABSTRACT OF THE DISCLOSURE An amorphous, low-retentivity alloy contains cobalt, manganese, silicon and boron. The alloy has the composition (CoaNibTcMndFee)100-t(SixByMz)t, whereby T is at least one of the elements chromium, molybdenum, tungsten, vanadium, niobium, tantalumn, titanium, zirconiwn and hafnium and M is at least one of the elements phosphorous, carbon, aluminum, gallium, indium, germanium, tin, lead, arsenic, antimony, bismuth and beryllium and the follow- ing relationships apply: 0.39 ? a ? 0.99; 0 ? b ? 0.40; 0 ? c ? 0.08; 0.01 ? d ? 0.l3; 0 ? ? ? 0.02; 0.01 ? d+e ? 0.13; a + b + c + d + e = 1; 18 ? t ? 35; 8 ? xt ? 24; 4 ? yt ? 24; 0 ? zt ? 8; and x + x + z = 1. The inventive alloy is distinguished by a saturation magnetostriction ? 5 ? 10-6 and is particularly suited for magnetic screens, sound heads and magnetic cores.

353870

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