C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/306.2, 71/7.
C07D 209/48 (2006.01) A01N 39/02 (2006.01) A01N 39/04 (2006.01) A01N 43/38 (2006.01) C07D 403/12 (2006.01)
Patent
CA 1163635
ABSTRACT OF THE DISCLOSURE The present invention provides N-(3-substituted oxy- phenyl)-3,4,5,6-tetrahydrophthalimides which are represent- ed by the general formula Image (1) wherein X and Y respectively represent hydrogen or a halogen atom; A represents Image , or -CH2CH=CH; B reprsents Image or -CN; R1represents a hydrogen atom or an alkyl, phenyl or a phenyl group substituted by at least one of halogen, lower alkyl or nitro groups; R2 represents a hydrogen atom or an alkyl group; R3 represents a hydrogcn atom or an alkyl, alkenyl, alkynyl, haloalkyl, haloalkenyl, cyanoalkyl, hydroxyalkyl, alkoxyalkyl, alkoxyalkoxyalkyl, alkoxyalkoxy- alkoxyalkyl, alkylthioalkyl, cycloalkyl, aralkyl, phenyl, y-butylrolactone group which can be substituted by a methyl group or salt moiety selected from alkali and alkaline earth metals and ammonium groups having 0 to 4 alkyl groups; R4 represents an alkyl, alkoxycarbonylalkyl or benzyl group; R5 represents a hydrogen atom or methyl group; R6 repre- sents a methyl or phenyl group; R7 and R8 can be the same or different and respectively represent a hydrogen atom, an alkyl, alkenyl, alkynyl, haloalkyl, hydroxyalkyl, alkoxyalkyl, aralkyl, phenyl, phenyl substituted by at least one of halogen, lower alkyl and lower alkoxy groups, a 5 or 6 membered heterocyclic ring having at least one nitrogen atom, alkoxy, alkenyloxy, amino, amino mono substi- tuted with lower alkyl or phenyl, di-lower alkyl amino, alkanesulfonyl, benzenesulfonyl, benzenesulfonyl substi- tuted by at least one of halogen, lower alkyl and lower alkoxy groups or cycloalkyl group; R8 can form a 5 to 7 membered nitrogen containing and Image heterocyclic ring which can contain a -O- atom; and m and n respectively represent an integer of 1 to 3. The com- pounds are useful as selective herbicides.
387319
Jikihara Tetsuo
Natsume Bunji
Oda Masatsugu
Suzuki Seiichi
Watanabe Hisao
Marks & Clerk
Mitsubishi Chemical Industries Ltd.
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