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Patent
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F
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G03F 7/00 (2006.01) B24C 1/04 (2006.01) B41M 1/30 (2006.01) D06P 5/00 (2006.01) G03F 7/038 (2006.01) G03F 7/12 (2006.01) G03F 7/16 (2006.01) G03F 7/20 (2006.01) G03F 7/30 (2006.01)
Patent
CA 2028442
ABSTRACT OF THE DISCLOSURE The present invention relates to a letterpress for transferring on which a dot-like fine form plate surface is formed closely following a photoimage, and to a method of transferring by use of the letterpress for transferring by which a photosensitive resin is exposed through a photofilm to a parallel light, the area other than the hardened film of the photosensitive resin corresponding to the light- screening area of the photofilm is removed by being rinsed with water to form a letterpress for transferring having a convex corresponding to the light-penetrating area of the photofilm, then the convex is directly coated with various dyes and press printed on and transferred to a transferred material, or the convex is coated with a photosensitive resin and press printed on a transferred material, and then the photosensitive resin film transferred is exposed to light and a non-light exposure area is rinsed with water, thereby allowing the material to be applied as a mask for resist for dyeing or blast processing.
Kurumisawa Kuninobu
Marks & Clerk
LandOfFree
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